发明名称 MANUFACTURE OF SHROUD FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要 PURPOSE:To obtain a shroud of light weight, good heat conductivity and good anti-corrosion by forming a film which has the resistance against corrosion of gallium inside a cylinder for the shroud made of Al. CONSTITUTION:A cylinder which has a space for cooling fluid flow in the circumferential wall for a shroud made of Al is made. Then, a film which has the resistance against the corrosion by gallium is formed by ion-plating on at least the inner surface of both the inner and the outer surfaces of the cylinder. The cylinder for the shroud has a spiral pipe for cooling fluid flow made of Al connected to the outside of the Al cylinder or an Al plate which has a pipe-like swelling for cooling fluid flow, is made cylinder-shaped and the projection is connected, etc. This can provide the shroud of light weight, good heat conductivity and good anti-corrosion.
申请公布号 JPS62102518(A) 申请公布日期 1987.05.13
申请号 JP19850243664 申请日期 1985.10.29
申请人 SHOWA ALUM CORP 发明人 KATO YUTAKA;ISOYAMA EIZO
分类号 H01L21/203;C23C14/00;C23C14/06;C23C14/16;C23C14/24;C23C14/32;H01L21/26 主分类号 H01L21/203
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