发明名称 |
TREATMENT OF PLATING SOLUTION |
摘要 |
PURPOSE:To remove iron ions selectively, easily and efficiently from an acidic plating soln. in a short time by treating the plating soln. with a chelate resin having phosphoric acid groups, phosphino groups and phosphono groups. CONSTITUTION:An acidic plating soln. contg. iron ions such as a galvanizing soln. is treated with a chelate resin having phosphoric acid groups and phosphino groups and/or phosphono groups. It is preferable that the chelate resin contains at least one kind of structural unit selected among units represented by formulae I-V (where R is H or halogen and/or alkyl) and has a macro-network (macroporous) structure. The plating soln. is preferably treated at about 1-6 pH by passing through a bed packed with granules of the chelate resin. The iron ions in the plating soln. are selectively adsorbed on the chelate resin by coordination and removed from the plating soln.
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申请公布号 |
JPS62146299(A) |
申请公布日期 |
1987.06.30 |
申请号 |
JP19850285333 |
申请日期 |
1985.12.18 |
申请人 |
EGAWA HIROAKI;MOTOZATO YOSHIAKI;KURITA WATER IND LTD |
发明人 |
EGAWA HIROAKI;MOTOZATO YOSHIAKI;SATO SHIGEAKI;JOKO ISAO |
分类号 |
C02F1/42;C25D21/18;C25D21/22 |
主分类号 |
C02F1/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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