发明名称 TREATMENT OF PLATING SOLUTION
摘要 PURPOSE:To remove iron ions selectively, easily and efficiently from an acidic plating soln. in a short time by treating the plating soln. with a chelate resin having phosphoric acid groups, phosphino groups and phosphono groups. CONSTITUTION:An acidic plating soln. contg. iron ions such as a galvanizing soln. is treated with a chelate resin having phosphoric acid groups and phosphino groups and/or phosphono groups. It is preferable that the chelate resin contains at least one kind of structural unit selected among units represented by formulae I-V (where R is H or halogen and/or alkyl) and has a macro-network (macroporous) structure. The plating soln. is preferably treated at about 1-6 pH by passing through a bed packed with granules of the chelate resin. The iron ions in the plating soln. are selectively adsorbed on the chelate resin by coordination and removed from the plating soln.
申请公布号 JPS62146299(A) 申请公布日期 1987.06.30
申请号 JP19850285333 申请日期 1985.12.18
申请人 EGAWA HIROAKI;MOTOZATO YOSHIAKI;KURITA WATER IND LTD 发明人 EGAWA HIROAKI;MOTOZATO YOSHIAKI;SATO SHIGEAKI;JOKO ISAO
分类号 C02F1/42;C25D21/18;C25D21/22 主分类号 C02F1/42
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