| 摘要 |
PURPOSE:To relieve the product of defective characteristics arising from the fluctuation of the characteristics of a filter and to improve productivity and yield by subjecting multi-layered dielectric films, the characteristics of which fluctuate after exposing to the atm., to a high-temp. heat treatment in air or oxidative atmosphere of oxygen, etc. CONSTITUTION:The high-temp. heat treatment is executed as a means for making uniform the thin films made into multiple layers having factors for unstable fluctuations. the desorption of the absorbed moisture penetrated and diffused into the film and the change of the film compsn. progress as the effect by the heat treatment and the tendency that the x value of the stoichimetric compsn. approaches 2.0 is down in the case of TiOx and SiCx. The quality of the films is made stable by such compsn. change; at the same time, the change quantity thereof can be controlled by the conditions for the heat treatment. The defective filter resulted by the gradual fluctuation of the central wavelength of the filter characteristics to the longer wavelength side by the exposure to the atm. and the generation of a deviation from the objective characteristics is subjected to the heat treatment according t the amt. of said fluctuation, by which the wavelength is reverses shifted to the shorter wavelength side and at the same time the stable filter characteristics having the excellent environmental resistance are obtd.
|
