发明名称 LASER CVD EQUIPMENT
摘要 PURPOSE:To obtain a laser CVD equipment which easily forms an alloy thin film using a laser beam effectively by providing a reflecting mirror which has a spheroid in the optical path of a laser light and by spouting a gas to each focus. CONSTITUTION:An elliptic spherical mirror 14 is provided above the outer circumference of a substrate susceptor 5 in a reaction tank 4. A raw material gas spouted from a nozzle 21 positioned at the focus A of an ellipse causes a photochemical reaction with laser light 2 and forms a radical flow 23. The laser light is reflected by the elliptic spherical mirror 14 and converged to the focus B of the ellipse. The radical flow 23 is also formed from the raw material gas spouted from a nozzle 22 positioned at a converging point. The light which passed the focus B is reflected again by the spherical mirror 14 and converged to the focus A, then converged to the focus B and the reflection is repeated until the energy of the irradiated laser light 2 is perfectly consumed. This can use the laser light effectively. The obtained radical flow 23 is blown to a substrate 6 and is deposited to form a thin film.
申请公布号 JPS62266821(A) 申请公布日期 1987.11.19
申请号 JP19860110362 申请日期 1986.05.14
申请人 FUJI ELECTRIC CO LTD 发明人 KAMIYAMA MICHIYA
分类号 H01L21/205;H01L21/263;H01L21/31 主分类号 H01L21/205
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