发明名称 MANUFACTURE OF MULTILAYERED SUBSTRATE
摘要 PURPOSE:To simplify the manufacturing process of a multilayered substrate and to lessen the delay of signal propagation by a method wherein a polymethyl pentene film is used as an organic film. CONSTITUTION:A first wiring layer 2 is formed on an alumina substrate 1 using a Cu deposited film of a thickness of 1mum, then a polymethyl pentene polymerized film of a thickness of 3mum is formed by plasma polymerization using 1-methyl-4 pentene as a monomer to use as an insulating layer 3. A KrF excimer laser is irradiated locally on the polymethyl pentene film to form a through hole 4 of a size of 10mum and a second wiring layer 5 is formed using an Au deposited film of a thickness of 1mum to complete a multilayered substrate.
申请公布号 JPS6414995(A) 申请公布日期 1989.01.19
申请号 JP19870169638 申请日期 1987.07.09
申请人 TOSHIBA CORP 发明人 NIITSUMA AKIRA;MIYAGI TAKESHI
分类号 H05K3/46 主分类号 H05K3/46
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