发明名称 |
Method of manufacturing non-linear resistive element array |
摘要 |
A method for manufacturing a non-linear resistive element array on a substrate, comprising: depositing a first conductive layer on the substrate and selectively forming the layer in a desired pattern; depositing a non-linear resistive layer on the first conductive layer; depositing a second conductive layer on the non-linear resistive layer; forming the second conductive layer in a desired pattern by etching process using a patterned resist layer as a mask; and forming the non-linear resistive layer in a desired pattern using the resist layer as a mask.
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申请公布号 |
US4895789(A) |
申请公布日期 |
1990.01.23 |
申请号 |
US19880174833 |
申请日期 |
1988.03.29 |
申请人 |
SEIKO INSTRUMENTS INC. |
发明人 |
MOTTE, SHUNICHI;SUZUKI, MITSUYA |
分类号 |
G02F1/1365;H01C17/00;H05K1/16;H05K3/06;H05K3/38 |
主分类号 |
G02F1/1365 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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