发明名称 Method of manufacturing non-linear resistive element array
摘要 A method for manufacturing a non-linear resistive element array on a substrate, comprising: depositing a first conductive layer on the substrate and selectively forming the layer in a desired pattern; depositing a non-linear resistive layer on the first conductive layer; depositing a second conductive layer on the non-linear resistive layer; forming the second conductive layer in a desired pattern by etching process using a patterned resist layer as a mask; and forming the non-linear resistive layer in a desired pattern using the resist layer as a mask.
申请公布号 US4895789(A) 申请公布日期 1990.01.23
申请号 US19880174833 申请日期 1988.03.29
申请人 SEIKO INSTRUMENTS INC. 发明人 MOTTE, SHUNICHI;SUZUKI, MITSUYA
分类号 G02F1/1365;H01C17/00;H05K1/16;H05K3/06;H05K3/38 主分类号 G02F1/1365
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