| 摘要 |
PURPOSE:To obtain the pattern forming material having a large contrast by using a photosensitive agent contg. the naphthoquinone diazide sulfonate of a bisphenol compd. as a dissolution inhibitor and an alkaline-soluble resin as a base resin. CONSTITUTION:This material consists of the photosensitive agent contg. the comopd. expressed by formula I as the dissolution inhibitor and the alkaline- soluble phenolic resin. In the formula I, X denotes CH2, SO2, S, C(CH3)2; R denotes a naphthoquinone diazide sulfonyl group. Namely, the dissolution inhibitive effect of the naphthoquinone diazide sulfonate of the bisphenol compd. in an alkaline aq. soln. is higher than the dissolution inhibitive effect of trihydroxybenzophenone and the naphthoquinone diazide sulfonate. The resist having the high contrast is obtd. by using the photosensitive agent having the large dissolution inhibitive effect in this way. |
