| 摘要 |
PURPOSE:To enable the formation of color filters having exceedingly outstanding optical characteristics by forming functional coating films having high accuracy not only on transparent conductive circuit patterns but in the spacings between these circuit patterns as well. CONSTITUTION:The coating film of a positive type photoresist is formed over the entire part of a transparent substrate having the fine conductive circuit patterns and a grid-shaped pattern mask is superposed on the coated surface. The photoresist is then exposed and developed to form the coating films of the positive type photoresist to a grid shape. After an electrodeposition coating film having light shieldability is formed between the coating films, only the coating films of the positive type photoresist are removed by peeling. A negative type photoresist is then applied over the entire part of the transparent substrate including the electrodeposition coating film and is exposed from the rear surface of the transparent substrate. The uncured parts of the unexposed coating film of the negative type photoresist are eluted, by which the grid-shaped functional coating films are formed between the fine conductive circuits. |
