| 摘要 |
<p>PURPOSE:To effectively cool a mask, a substrate such as a wafer or the like and a holding plate holding them during an exposure by a method wherein the holding plate which is supported inside an exposure chamber by an elastic member integrated with a base plate, at least one cooling member which is brought close to the holding plate and a cooling means which cools it are provided. CONSTITUTION:A mask-temperature-regulating base 4 and a mask holding plate 6 are coupled integrally via a plurality of mask plate springs 5 as elastic members. Then, a mask cooling block 7 as a cooling member provided with annular face 7a which is faced with the outer circumferential face 6a of the mask holding plate 6 via a very small gap is arranged. Thereby, it is possible to realize a positioning stage device in which a mask, a substrate such as a wafer or the like and the holding plate supporting them during an exposure are cooled effectively and in which there is no fear that vibrations are given to them due to the flow of a temperature-regulating coolant.</p> |
