发明名称 METHOD AND APPARATUS FOR DEPOSITING THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a method and an apparatus for depositing a thin film to automatically deposit a thin film of a constant optical property with excellent recyclability. SOLUTION: A raw vapor deposition material 4 is evaporated by an electron beam gun 3 to deposit a reflection preventive film on a lens 2a held by a coat dome 2. The power applied to the electron beam gun 3 is controlled so that the quantity of the transmitted or reflected light to be measured moment by moment by an optical film thickness meter 10 is approximate to or equal to the reference quantity of light stored in a reference light quantity data storing means.
申请公布号 JP2001123269(A) 申请公布日期 2001.05.08
申请号 JP19990299829 申请日期 1999.10.21
申请人 HOYA CORP 发明人 NIIDE KENICHI
分类号 G02B1/11;C23C14/54 主分类号 G02B1/11
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