发明名称 |
METHOD AND SYSTEM FOR FILM DEPOSITION BY NEGATIVE ION IRRADIATION AND MULTI-SOURCE EVAPORATION |
摘要 |
<p>PROBLEM TO BE SOLVED: To form, e.g. a functional film which is composed of multi-source elements and in which insulating materials are used as base materials of film by means of dynamic mixing treatment. SOLUTION: This film forming method is exerted by means of dynamic mixing treatment where the application of ion irradiation from an ion source to the surface of a sample substrate is carried out simultaneously with the evaporation of base materials of film onto the surface of the sample substrate in a vacuum vessel. The ions projected from the ion source are negative ions and the base materials of film are insulating materials, and a fine-particle- dispersed film in which fine particles are dispersed can be formed.</p> |
申请公布号 |
JP2001140056(A) |
申请公布日期 |
2001.05.22 |
申请号 |
JP20000264418 |
申请日期 |
2000.08.31 |
申请人 |
NATL RESEARCH INST FOR METALS MINISTRY OF EDUCATION CULTURE SPORTS SCIENCE & TECHNOLOGY |
发明人 |
KISHIMOTO NAOKI;TAKEDA YOSHIHIKO;KONO KENICHIRO |
分类号 |
G02F1/355;C23C14/06;C23C14/48;H01J37/317;(IPC1-7):C23C14/06 |
主分类号 |
G02F1/355 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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