发明名称 METHOD AND SYSTEM FOR FILM DEPOSITION BY NEGATIVE ION IRRADIATION AND MULTI-SOURCE EVAPORATION
摘要 <p>PROBLEM TO BE SOLVED: To form, e.g. a functional film which is composed of multi-source elements and in which insulating materials are used as base materials of film by means of dynamic mixing treatment. SOLUTION: This film forming method is exerted by means of dynamic mixing treatment where the application of ion irradiation from an ion source to the surface of a sample substrate is carried out simultaneously with the evaporation of base materials of film onto the surface of the sample substrate in a vacuum vessel. The ions projected from the ion source are negative ions and the base materials of film are insulating materials, and a fine-particle- dispersed film in which fine particles are dispersed can be formed.</p>
申请公布号 JP2001140056(A) 申请公布日期 2001.05.22
申请号 JP20000264418 申请日期 2000.08.31
申请人 NATL RESEARCH INST FOR METALS MINISTRY OF EDUCATION CULTURE SPORTS SCIENCE & TECHNOLOGY 发明人 KISHIMOTO NAOKI;TAKEDA YOSHIHIKO;KONO KENICHIRO
分类号 G02F1/355;C23C14/06;C23C14/48;H01J37/317;(IPC1-7):C23C14/06 主分类号 G02F1/355
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