| 摘要 |
PROBLEM TO BE SOLVED: To obtain a high sensitivity positive type radiation sensitive composition having such resolution as to enable a sub-quarter micron patterning. SOLUTION: The positive type radiation sensitive composition contains a) a compound having a carboxyl group protected by an acid releasable group of formula (1) (where R1 and R2 are each an aromatic ring and R3 and R4 are each H, an alkyl, substituted alkyl, cycloalkyl, aryl or substituted aryl) and b) an acid generating agent which generates an acid when irradiated with radiation. The method for producing a resist pattern using the composition is also provided. |
