RADIATION SENSITIVE RESIN COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition ensuring good resolution and a good section shape of a pattern and suitable for use as a positive type resist having a good margin for exposure. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- soluble novolak resin and (B) a naphthoquinonediazidosulfonic ester compound of a phenol compound of formula (1) [where R1 and R2 are each a monovalent organic group having alkyl or aryl; R3 is H or alkyl; and (a) and (b) are each an integer of 0-2] having a structure corresponding to tertiary carbon in a position adjacent to a hydroxyl group. Preferably (C) a low molecular weight compound containing two or three benzene rings and having at least one hydroxyl group on each of the benzene rings is further contained.