| 摘要 |
A three dimensional mask can adjusts the coherence of radiation passing through an edge pattern on the mask by increasing the thickness of an opaque layer to extend the passing path in the edge pattern, thereby can reduce optical proximity effect (OPE) causing from interference. Therefore, shape distortion and depth of focus (DOF) deficiency occurring on the edge pattern can be prevented to expose a fine pattern to a photoresist layer.
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