发明名称 |
TREATMENT MATERIAL FOR DELETERIOUS SUBSTANCE AND MANUFACTURING METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To provide a treatment material for a deleterious substance that absorbs ultraviolet light necessary for photocatalyst activity and that hardly undergoes peeling of a formed transition metal oxide film while maintaining sufficient sterilizing property. SOLUTION: A titanium dioxide film 5 inactivates Escherichia Coli or HIV which is incoporatable into a substance to be treated such as components of blood plasma. The control of the film thickness of the titanium dioxide film 5 becomes easy by forming the titanium dioxide film 5 on the surface of a substrate 6 having ultraviolet light penetrability by means of the atmospheric pressure CVD process. When the film thickness of titanium dioxide film 5 is from 1 to 7μm, the titanium oxide film 5 is able to absorb ultraviolet light necessary for photocatalyst activity and is difficult to be stripped from the substrate 6 while maintaining sufficient antibacterial and sterilizing properties.
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申请公布号 |
JP2003117405(A) |
申请公布日期 |
2003.04.22 |
申请号 |
JP20010313174 |
申请日期 |
2001.10.10 |
申请人 |
NORITAKE CO LTD;YAMAGUCHI AKISHI |
发明人 |
KUROBE HISATOKU;KATO SHINJI;WATANABE HIROKAZU;IWATA MISAO;KONDO TSUNEICHI;YAMAGUCHI AKISHI |
分类号 |
A61M1/36;B01J35/02;B01J37/02;C23C16/40;(IPC1-7):B01J35/02 |
主分类号 |
A61M1/36 |
代理机构 |
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