发明名称 TREATMENT MATERIAL FOR DELETERIOUS SUBSTANCE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a treatment material for a deleterious substance that absorbs ultraviolet light necessary for photocatalyst activity and that hardly undergoes peeling of a formed transition metal oxide film while maintaining sufficient sterilizing property. SOLUTION: A titanium dioxide film 5 inactivates Escherichia Coli or HIV which is incoporatable into a substance to be treated such as components of blood plasma. The control of the film thickness of the titanium dioxide film 5 becomes easy by forming the titanium dioxide film 5 on the surface of a substrate 6 having ultraviolet light penetrability by means of the atmospheric pressure CVD process. When the film thickness of titanium dioxide film 5 is from 1 to 7μm, the titanium oxide film 5 is able to absorb ultraviolet light necessary for photocatalyst activity and is difficult to be stripped from the substrate 6 while maintaining sufficient antibacterial and sterilizing properties.
申请公布号 JP2003117405(A) 申请公布日期 2003.04.22
申请号 JP20010313174 申请日期 2001.10.10
申请人 NORITAKE CO LTD;YAMAGUCHI AKISHI 发明人 KUROBE HISATOKU;KATO SHINJI;WATANABE HIROKAZU;IWATA MISAO;KONDO TSUNEICHI;YAMAGUCHI AKISHI
分类号 A61M1/36;B01J35/02;B01J37/02;C23C16/40;(IPC1-7):B01J35/02 主分类号 A61M1/36
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