| 摘要 |
The low beam filament (51) and the high beam filament (52) are disposed in such a positional relationship as the virtual image of the irradiated portion of the high beam filament (52) does not produce glaring light in the low beam light distribution pattern. As a result, it is made possible to effectively utilize near 100% of light incident on the reflecting surface (40) of a reflector (4) and to obtain good low beam light distribution pattern and high beam light distribution pattern. <IMAGE>
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