| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a designing method of photomask which can lighten the memory load of a computer when a photomask having a dummy region of an active region arranged in a field region is manufactured. <P>SOLUTION: In the whole region of a semiconductor substrate, dummy regions as dummies of the active region are arranged first. Then it is decided whether each dummy region is present within a certain distance from an area where a dummy region should not be arranged and dummy regions which are present within the certain distance are removed. Here, regions where a dummy region should not be arranged is, for example, the active region, a well region, and an N well register region. The pattern of dummy regions left after the removal processing and the pattern of the active region are put together to design the photomask as to the active region. <P>COPYRIGHT: (C)2003,JPO</p> |
