发明名称 Multilayer gallium arsenide semiconductor - for laser diode
摘要 <p>Prodn. of a semiconductor diode contg. a series of epitaxially formed layers of n-GaAs - n - GaHAs - GaAs - p - GaHAs - p - GaAs is improved by forming a supernumerary layer, pref. GaAlAs, and finally etching it away, pref. with hydrochloric acid. By this method, the formation of the p - GaAs layer which must be very thin (0.005 mm) is facilitated, compared with the conventional method of allowing it to grow thicker and then grinding to the required thickness.</p>
申请公布号 DE2225424(A1) 申请公布日期 1973.12.06
申请号 DE19722225424 申请日期 1972.05.25
申请人 LICENTIA PATENT-VERWALTUNGS-GMBH, 6000 FRANKFURT 发明人 RIEMANN, VOLKER, DIPL.-PHYS., 7310 PLOCHINGEN
分类号 C30B19/04;C30B19/10;C30B33/00;H01L21/208;H01L21/306;H01L33/00;(IPC1-7):05B33/16 主分类号 C30B19/04
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