发明名称 |
Multilayer gallium arsenide semiconductor - for laser diode |
摘要 |
<p>Prodn. of a semiconductor diode contg. a series of epitaxially formed layers of n-GaAs - n - GaHAs - GaAs - p - GaHAs - p - GaAs is improved by forming a supernumerary layer, pref. GaAlAs, and finally etching it away, pref. with hydrochloric acid. By this method, the formation of the p - GaAs layer which must be very thin (0.005 mm) is facilitated, compared with the conventional method of allowing it to grow thicker and then grinding to the required thickness.</p> |
申请公布号 |
DE2225424(A1) |
申请公布日期 |
1973.12.06 |
申请号 |
DE19722225424 |
申请日期 |
1972.05.25 |
申请人 |
LICENTIA PATENT-VERWALTUNGS-GMBH, 6000 FRANKFURT |
发明人 |
RIEMANN, VOLKER, DIPL.-PHYS., 7310 PLOCHINGEN |
分类号 |
C30B19/04;C30B19/10;C30B33/00;H01L21/208;H01L21/306;H01L33/00;(IPC1-7):05B33/16 |
主分类号 |
C30B19/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|