| 发明名称 |
SOFT XXRAY TRANSCRIPTION MASK |
| 摘要 |
PURPOSE:To secure the tensile force as well as to increase the intensity for a film by providing high-density B diffusion layer onto the rear surface opposite to the absorber pattern formation surface, and thus to obtain a soft X-ray transcription mask for micro patterns. |
| 申请公布号 |
JPS5349953(A) |
申请公布日期 |
1978.05.06 |
| 申请号 |
JP19760123807 |
申请日期 |
1976.10.18 |
| 申请人 |
HITACHI LTD |
发明人 |
MIYAZAKI MASARU;TAKEMOTO KAYAO |
| 分类号 |
G03F1/00;G03F1/22;G03F1/68;H01L21/027;H01L21/30 |
主分类号 |
G03F1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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