| 摘要 |
Provided is a sputtering target equipped with a flat part and a taper part, wherein the sputtering target is characterized in that a machined groove for use in ignition is positioned on the sputtering surface of the target. It is possible to lower the lighting failure rate during ignition (plasma lighting), and initiate the sputtering process consistently. In so doing, downtime of the device can be shortened, contributing to improved throughput and enhanced cost performance. |
