| 摘要 |
PURPOSE:To form a positive type resist high in resolution and sensitivity and superior in developability, pattern shape, adhesiveness, and heat resistance, and sufficient in focus allowance by incorporating a specified alkali-soluble novolak resin and a specified compound. CONSTITUTION:The resin composition comprises at least one of the phenols represented by formulae I and II and the alkali-soluble novolak resin obtained by polycondensing m-cresol or/and p-cresol with aldehyde, and one of the compounds represented by formulae III and IV. In formulae I=TV, m is 2 or 3; each of R<1>-R<17> is H, 1-4 C alkyl, or the like; R<13> is H, 1-4C alkyl, acetyl, or benzoyl. |
