| 摘要 |
PURPOSE:To provide a radiation sensitive resin compsn. having satisfactory developability, giving a fine pattern shape of a resist pattern, especially excellent in dimensional faithfulness and focus latitude and capable of forming a high precision resist pattern by incorporating an alkali-soluble resin and a specified compd. or further incorporating other compd. having a quinonediazido group. CONSTITUTION:This radiation sensitive resin compsn. contains an alkalisoluble resin and a compd. represented by the formula or further contains other compd. having a quinonediazido group in the case where all of D's in the formula are H atoms. In the formula, each of X<1>-X<8> is H, alkyl, alkoxy or -OD (D is H or an org. group having a quinonediazido group), at least one of X<1>-X<8> is -OD and R is a single bond, alkylene or phenylene. |
