| 摘要 |
PURPOSE:To ensure high sensitivity, high resolution, superior heat resistance, dimensional controllability and pattern shape by specifying poly (p- hydroxystyrene), a dissolution inhibitor, an onium salt, a nonionic surfactant, an acid deactivator and an org. solvent. CONSTITUTION:This resist compsn. contains poly(p-hydroxystyrene), a dissolution inhibitor, an onium salt, a nonionic surfactant, an acid deactivator and an org. solvent. The poly(p-hydroxystyrene) is synthesized by anionic polymn. and the wt. average mol. wt. is 8,000-20,000. The dissolution inhibitor is bis (p-t- butoxycarbonylmethyl)thymolphthalein represented by the formula. The onium salt is bis (p-t-butylphenyl)iodonium triflate. The acid deactivator is a compd. having one amino group and one carboxyl group in one molecule. The org. solvent is propylene glycol monomethyl ether acetate. |
