发明名称 |
DEVICE FOR SUPPLYING MINUTE AMOUNT OF LIQUID MATERIAL AND PATTERN CORRECTING METHOD USING THE SAME |
摘要 |
PURPOSE: To provide a device capable of supplying a minute amt. of the liq. material consisting of a highly volatile component such as resist varnish and a highly viscous or caking component without causing clogging at the tip of a pipet and the wetting of the tip of the pipet with the material. CONSTITUTION: This device consists of a hollow pipet 1 with the tip contracted, a driving mechanism 2 to coarsely or finely move the pipet 1, a mechanism 3 to apply a pulsed gas pressure on the pipet 1, an observation system 4 to monitor a liq. material feed part and a means 10 to fill the space around the pipet 1 with an atmosphere contg. the vapor of the volatile component contained in a liq. material 5, and a film to prevent the wetting with the liq. material 5 is formed on at least the tip of the pipet 1 and the outer surface close to the tip. The liq. material 5 contg. a highly volatile component such as resist varnish filled in the pipet 1 is optionally supplied in a specified amt. to the pattern-deficient part of a substrate 7 to correct the pattern. |
申请公布号 |
JPH0866652(A) |
申请公布日期 |
1996.03.12 |
申请号 |
JP19950142072 |
申请日期 |
1995.06.08 |
申请人 |
HITACHI LTD |
发明人 |
HONGO MIKIO;SAKAMOTO HARUHISA;MARUYAMA SHIGENOBU;MIYAUCHI TAKEOKI;MIZUKOSHI KATSURO;IMATAKE MITSUKO;KATAYAMA KAORU;MATSUZAKI HIDEO;MIYATA KAZUFUMI |
分类号 |
B05D1/26;B05C5/00;B05C11/00;B05D7/00;H01L21/027;H05K3/22;(IPC1-7):B05C5/00 |
主分类号 |
B05D1/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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