| 摘要 |
PROBLEM TO BE SOLVED: To provide a forming method of a metal oxide thin film positive pattern composed of a sharp pattern. SOLUTION: The metal oxide thin film pattern forming method comprises forming the pattern by exposing a coating film formed by using a metal oxide thin film pattern forming composition, which consists of a metal oxide thin film forming composition and a photosensitizer and causes the difference in the reaction with a solvent by light irradiation, with irradiation active beam to form an image, and developing with the solvent. A positive pattern is formed by using water as the solvent with >5mj/cm<2> to <100mj/cm<2> irradiation energy for image forming exposure. The photosensitizer consists of one or more kinds selected from a group composed of nitrobenzyl alcohols, nitrobenzaldehydes, nitrostyrols, nitroacetophenone, nitroanisols and nitrofurans, if necessary the coating film after developed is heat treated and the irradiation active beam used for the image forming exposure is one of ultraviolet ray, electron beam, X-ray or ion beam. |
