发明名称 METHOD AND DEVICE FOR PROCESSING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing, wherein particles are prevented from sticking to a substrate when shifting from chemical process to water- washing process, consumption of pure water at water-washing process is reduced, and the water-washing process is completed in a short time. SOLUTION: A substrate W which is chemically processed at a position DP in a multi-functional process bath 562 starts rising toward a position DR, together with a lifter 563. During rising, a substrate surface part appearing above the chemical level in the multi-functional process bath 562 is supplied with such a freezing gas as low-temperature nitrogen gas from a freezing gas blowout part 565. As a result of this, a sticking liquid at a part of the substrate is frozen instantaneously in the vicinity immediately above the liquid level. Meanwhile, at the multi-functional process bath 562, the chemical is discharged, while cooling pure water is supplied. A substrate W shielded from an external atmosphere by freezing is submerged in the multi-functional process bath 562, which reserves the cooling pure water for water-washing process.
申请公布号 JPH11111658(A) 申请公布日期 1999.04.23
申请号 JP19970272648 申请日期 1997.10.06
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MOTOMURA MASAHIRO
分类号 H01L21/677;H01L21/304;H01L21/306;H01L21/68;(IPC1-7):H01L21/304 主分类号 H01L21/677
代理机构 代理人
主权项
地址