Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound

摘要

A radiation-sensitive resin composition includes a polymer including a structural unit that includes an acid-labile group; and a compound represented by formula (1). R1 represents a monovalent organic group having 1 to 30 carbon atoms. L represents a single bond, an oxygen atom or a sulfur atom. M+ represents a monovalent radioactive ray-labile onium cation. The monovalent organic group represented by R1 is preferably a monovalent hydrocarbon group or a monovalent fluorinated hydrocarbon group, and L preferably represents a single bond. The monovalent organic group represented by R1 is preferably a monovalent hydrocarbon group, a monovalent fluorinated hydrocarbon group, a monovalent aliphatic heterocyclic group or a monovalent fluorinated aliphatic heterocyclic group, and L preferably represents an oxygen atom or a sulfur atom. The monovalent radioactive ray-labile onium cation represented by M+ is preferably represented by the formula (X).;

主权项

1. A radiation-sensitive resin composition comprising:
a polymer that comprises a structural unit that comprises an acid-labile group; and a compound represented by formula (1): wherein in the formula (1),
R1 represents a monovalent organic group having 1 to 30 carbon atoms;L represents a single bond, an oxygen atom or a sulfur atom; andM+ represents a monovalent radioactive ray-labile onium cation which is labile to a KrF excimer laser, an ArF excimer laser, an electron beam or an EUV, andin a case where L represents a single bond, the monovalent radioactive ray-labile onium cation represented by M+ is represented by formula (X): wherein in the formula (X),
Ra represents a fluorine atom, a hydroxy group, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an alkoxycarbonyl group having 2 to 11 carbon atoms or an alkylsulfonyl group having 1 to 10 carbon atoms;j is an integer of 0 to 9, wherein in a case where j is no less than 2, a plurality of Ras are each identical or different;Rb and Rc each independently represent a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, or Rb and Rc taken together represent a ring structure having 4 to 10 ring atoms together with the sulfur atom to which Rb and Rc bond; andk is an integer of 0 to 2.