| 摘要 |
PROBLEM TO BE SOLVED: To continuously and stably prepare a powder covered with a fine powder having a specific particle diameter with high productivity by sputtering using a gaseous mixture of Ar with O2 and/or N2 in a specific partial pressure ratio as a sputtering gas to deposit a metal or an alloy. SOLUTION: The powder of a metal, a ceramic, and organic body or the like having 0.1μto 10 mm average particle diameter is contained in a rotary vessel rotating at 100-500 cm/min peripheral speed to cover the surface of the powder with the metal or the alloy by sputtering. In such a case, the gaseous mixture of Ar with O2 and/or N2 is used as the sputtering gas, the partial pressure ratio is controlled to (1:0.01) to (1:1), preferably (1:0.05) to (1:0.5) and the pressure of the sputtering gas is preferably controlled to 0.1-10 Pa, particularly 0.3-7 Pa. As a result, the metal or the alloy layer deposited on the powder surface becomes finely powdered because the bond of nuclei with each other is suppressed by O2 or N2 to form the powder covered with the fine powder having <=10μm average particle diameter.
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