发明名称 |
SEMICONDUCTOR DEVICE, SEMICONDUCTOR WAFER, AND MANUFACTURE OF THE SEMICONDUCTOR DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To prevent warpage of a CSP(chip-scale package) semiconductor device and facilitate wiring within the semiconductor device. SOLUTION: A semiconductor element 12, which constitutes an integrated circuit, is formed on an element forming surface of a semiconductor chip 11. The element 12 is covered with a passivation film 13 made of silicon oxide or the like, which is a protection film, and the film 13 is covered with a first resin layer 14 for sealing. An electrode terminal 15 connected electrically to the element 12 is formed along the periphery on the element forming surface. A metallized wiring layer 16 connected electrically to the terminal 15 is provided at least along the periphery on the layer 14.</p> |
申请公布号 |
JP2001077231(A) |
申请公布日期 |
2001.03.23 |
申请号 |
JP19990249919 |
申请日期 |
1999.09.03 |
申请人 |
MATSUSHITA ELECTRONICS INDUSTRY CORP |
发明人 |
NAKAMURA YOSHIFUMI;SAWARA RYUICHI;KAINO NORIYUKI;SHIMOISHIZAKA NOZOMI;KUMAKAWA TAKAHIRO |
分类号 |
H01L23/12;H01L21/60;H01L23/29;H01L23/31;(IPC1-7):H01L23/12 |
主分类号 |
H01L23/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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