发明名称 SEMICONDUCTOR DEVICE, SEMICONDUCTOR WAFER, AND MANUFACTURE OF THE SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To prevent warpage of a CSP(chip-scale package) semiconductor device and facilitate wiring within the semiconductor device. SOLUTION: A semiconductor element 12, which constitutes an integrated circuit, is formed on an element forming surface of a semiconductor chip 11. The element 12 is covered with a passivation film 13 made of silicon oxide or the like, which is a protection film, and the film 13 is covered with a first resin layer 14 for sealing. An electrode terminal 15 connected electrically to the element 12 is formed along the periphery on the element forming surface. A metallized wiring layer 16 connected electrically to the terminal 15 is provided at least along the periphery on the layer 14.</p>
申请公布号 JP2001077231(A) 申请公布日期 2001.03.23
申请号 JP19990249919 申请日期 1999.09.03
申请人 MATSUSHITA ELECTRONICS INDUSTRY CORP 发明人 NAKAMURA YOSHIFUMI;SAWARA RYUICHI;KAINO NORIYUKI;SHIMOISHIZAKA NOZOMI;KUMAKAWA TAKAHIRO
分类号 H01L23/12;H01L21/60;H01L23/29;H01L23/31;(IPC1-7):H01L23/12 主分类号 H01L23/12
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