发明名称 OPTICAL SHUTTER TYPE EXPOSURE DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide an optical shutter type exposure device which is made higher in light control resolving power by light control filters while the light control filters of the same color density are used, in an optical shutter type exposure device provided with a light source for forming a luminous flux, plural optical shutter elements for exposing photosensitive materials in accordance with instructed image information, a condensing means for condensing the luminous flux and sending the condensed luminous flux to the optical shutter elements, the light control filters which are arranged in the luminous flux and are capable of regulating a light wavelength distribution, and a filter drive means for changing the advance quantity of the light control filters into the luminous fluxes. SOLUTION: The light control filters 20 are arranged in the positions on the upstream side from the condensing means 18 on the course for the luminous fluxes so as to advance into the luminous flux LB1 of a greater cross-sectional area.</p>
申请公布号 JP2001125207(A) 申请公布日期 2001.05.11
申请号 JP19990306391 申请日期 1999.10.28
申请人 NORITSU KOKI CO LTD 发明人 IYODA TOSHIAKI;KOBAYASHI KAZUHIRO
分类号 B41J2/445;G03B27/32;G03B27/73;(IPC1-7):G03B27/32 主分类号 B41J2/445
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