发明名称 Electrostatic remote plasma source system and method
摘要 This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma source. The power is provided by a first electrode that at least partially surrounds or is surrounded by a second electrode. The second electrode can be grounded or floating. First and second dielectric components can be arranged to separate one or both of the electrodes from the plasma and thereby DC isolate the plasma from one or both of the electrodes.
申请公布号 US9524854(B2) 申请公布日期 2016.12.20
申请号 US201514741109 申请日期 2015.06.16
申请人 Advanced Energy Industries, Inc. 发明人 Hoffman Daniel J.;Carter Daniel;Brouk Victor;Peterson Karen;Grilley Randy
分类号 H01J37/32;H05H1/46 主分类号 H01J37/32
代理机构 Neugeboren O'Dowd PC 代理人 Neugeboren O'Dowd PC
主权项 1. A remote plasma source system comprising: a first electrode; a second electrode, one of the first or second electrodes at least partially surrounding the other; a chamber enclosed by a chamber wall and configured to be externally coupled to a sub-atmospheric processing chamber, the chamber wall separating the first electrode from the second electrode, and the chamber including: a first path for the entry of a first fluid into the chamber; anda second path configured to provide a second fluid to the processing chamber, wherein the second fluid includes disassociated fluid created from the first fluid; and an RF power source input configured to couple to an RF power source and provide RF power from the RF power source to the first electrode, the RF power electrostatically coupling to the second electrode so as to electrostatically sustain a plasma within at least a portion of the chamber; a first dielectric component separating the first electrode from the plasma, DC isolating the first electrode from the plasma, and preventing the plasma from interacting with the first electrode; and a second dielectric component separating the second electrode from the plasma, DC isolating the second electrode from the plasma, and preventing the plasma from interacting with the second electrode; and controllable impedance matching circuitry coupled to the RF power source and the first electrode to enable operation of the remote plasma source across a range of sub-atmospheric pressures.
地址 Fort Collins CO US