| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner, an exposure method, and the manufacturing method of a device that can efficiently and stably reduce an absorption substance from space that is formed by a protection member in a mask, and can improve exposure accuracy. SOLUTION: A mask R is accommodated into a unit 55a, a given gas where exposure light is permeated is supplied into the unit 55a, and the inside of space GS that is formed by a protection member PE in a mask R is substituted with the given gas that is supplied into the unit 55a. |
