| 摘要 |
PROBLEM TO BE SOLVED: To transfer a reticle pattern onto a substrate with high accuracy.SOLUTION: An exposure apparatus includes: a stage system having a stage RST disposed above a projection optical system and holding reticles R1, R2 and a first motor for driving the stage; and an encoder system for measuring positional information of the stage moved by the first motor by use of a plurality of first heads 26Ato 26A, 26Bto 26B, 26Cto 26Cwhich irradiate reflective gratins of scales 24A, 24B, 28 disposed on the stage with a first measurement beam. The plurality of first heads includes: two first heads 26A, 26A, and the like arranged along a direction orthogonal to the optical axis of the projection optical system and at different positions with regard to a Y-axis direction where the stage RST is moved during scanning exposure; and one first head (26B, 26B, 26B) at a position different from the two first heads with regard to an X-axis direction.SELECTED DRAWING: Figure 2 |
