发明名称 EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To obtain an exposure device capable of preventing aberration from occurring. SOLUTION: When a laser beam L emitted from a semiconductor laser LD is divided into several in a subscanning direction by an array refracting element 36 and condensed on thermal sensitive material T, it is temporarily condensed at a 1st condensing position between a fiber array part 30 and the material T by a 1st optical system constituted of a 1st collimator lens 32A and a 1st condensing lens 38A. Then, the specified areas at both ends in the subscanning direction of the laser beam L are shielded by an array aperture plate 39 at the condensing position. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003262806(A) 申请公布日期 2003.09.19
申请号 JP20020062089 申请日期 2002.03.07
申请人 FUJI PHOTO FILM CO LTD 发明人 MIYAGAWA ICHIRO
分类号 B41J2/44;G02B26/10;G02B27/28;G03F7/24;H01L21/027;H04N1/113;H04N1/23;(IPC1-7):G02B26/10 主分类号 B41J2/44
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