发明名称 Bottom electrode structure for improved electric field uniformity
摘要 An integrated circuit with a multilayer bottom electrode, and a corresponding method for manufacturing the integrated circuit, are provided. An insulating layer includes an opening, and a bottom electrode substantially fills the opening. The bottom electrode includes a plurality of layers laterally or vertically stacked upon each other, and lining the opening. The layers of the plurality include corresponding surfaces facing an interior of the opening and extending respectively at angles relative to a top surface of the bottom electrode. Further, the layers of the plurality include corresponding regions of increased resistance or height extending along the corresponding surfaces. A dielectric layer is arranged over the insulating layer and the bottom electrode, and a top electrode arranged over the dielectric layer.
申请公布号 US9502649(B2) 申请公布日期 2016.11.22
申请号 US201514645932 申请日期 2015.03.12
申请人 Taiwan Semiconductor Manufacturing Co., Ltd. 发明人 Huang Jian-Shiou;Tsai Cheng-Yuan;Chang Yao-Wen
分类号 H01L45/00 主分类号 H01L45/00
代理机构 Eschweiler & Associates, LLC 代理人 Eschweiler & Associates, LLC
主权项 1. An integrated circuit comprising: an insulating layer with an opening; a bottom electrode including a plurality of layers stacked upon each other and lining the opening, wherein the layers of the plurality include corresponding surfaces facing an interior of the opening and extending at angles relative to a top surface of the bottom electrode, and wherein the layers of the plurality include corresponding regions of increased resistance or height extending along the corresponding surfaces; a dielectric layer arranged over the insulating layer and the bottom electrode; and a top electrode arranged over the dielectric layer.
地址 Hsin-Chu TW