| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint device which is advantageous in terms of throughput.SOLUTION: The imprint device for forming an imprint material that is supplied onto a wafer while using a mold comprises: a deformation part for deforming at least one of the mold and the wafer so as to have a projected shape that protrudes towards the other; and a control part which controls processing for starting contact of the mold and the imprint material in the state where the at least one of the mold and the wafer is deformed, and gradually reducing the deformation of the at least one of the mold and the wafer, thereby gradually enlarging a contact area of the mold and the imprint material. The control part controls relative positions of the mold and the wafer on the basis of the amount of deformation, by the deformation part, of the at least one of the mold and the wafer in such a manner that a positional relation between the mold and the wafer in starting the contact to the mold and the imprint material is maintained while the contact area is enlarged.SELECTED DRAWING: Figure 1 |
