发明名称 |
Process for forming an organic thin film |
摘要 |
An organic thin film consisting essentially of an organic compound is formed on a substrate surface by vacuum vapor deposition by exposing the organic compound as a vapor source to a laser beam having an energy level corresponding to that of the chemical bond of the organic compound, thereby sputtering the organic compound onto a substrate surface in vacuum and forming the organic thin film thereon. When a light or radiation-sensitive organic compound is used as the vapor source, a light or radiation-sensitive resist film is formed. The thin film thus formed retains the original chemical structure of the vapor source, and has a good flatness. Resolvability of resist film is improved owing to the absence of pin holes and particulate matters. A resist film having a higher sensitivity and a better contrast is formed by heating the substrate during the vapor deposition.
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申请公布号 |
US4604294(A) |
申请公布日期 |
1986.08.05 |
申请号 |
US19840660230 |
申请日期 |
1984.10.12 |
申请人 |
HITACHI, LTD. |
发明人 |
TANAKA, MASAHIRO;AZUMA, KAZUFUMI;NATE, KAZUO;NAKATANI, MITSUO |
分类号 |
G03C1/76;B05D3/06;B05D7/24;(IPC1-7):B05D3/06 |
主分类号 |
G03C1/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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