发明名称 POLISHING PAD AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a polishing pad having a polyurethane resin sheet having desired tanδ peak temperature and tanδ peak value.SOLUTION: There is provided a polishing pad having a polyurethane resin sheet obtained by reaction of a polyurethane bond-containing isocyanate compound (A) as a prepolymer, which is formed by reaction of a polyisocyanate compound (B) and a polyol compound (C) containing high-molecular-weight polyol having a number average molecular weight Mn, and a curing agent (D), in which, in the polyurethane resin sheet, a peak temperature Tof tanδ measured by a dynamic viscoelasticity test at measurement frequency 10 radian/second and in a tension mode satisfies expression (1), and when an equivalence ratio of an active hydrogen group existing in the curing agent (D) with respect to an isocyanate group existing at the terminal of the polyurethane bond-containing isocyanate compound (A) is represented by R, a peak value tanδof tanδ satisfies expression (2).SELECTED DRAWING: Figure 1
申请公布号 JP2016196058(A) 申请公布日期 2016.11.24
申请号 JP20150076727 申请日期 2015.04.03
申请人 FUJIBO HOLDINGS INC 发明人 MIYASAKA HIROHITO;TATENO TEPPEI;MATSUOKA RYUMA;KIRAKU YOSHIE
分类号 B24B37/24;C08G18/10;C08G18/66;C08G18/76;H01L21/304 主分类号 B24B37/24
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