MANUFACTURE OF SEMICONDUCTOR LASER,申请号JP19880001876-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	MANUFACTURE OF SEMICONDUCTOR LASER
摘要
申请公布号	JPH01179485(A)	申请公布日期	1989.07.17
申请号	JP19880001876	申请日期	1988.01.08
申请人	NEC CORP	发明人	KITAMURA MITSUHIRO;SASAKI TATSUYA;YAMADA HIROHITO
分类号	H01L21/205;H01S5/00	主分类号	H01L21/205
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Image display apparatus

Semiconductor component, active matrix substrate for a liquid crystal display, and methods of manufacturing such component and substrate

Active substance plasters

Microwave oven cleaner

Passive radiator having mass elements

Film forming method and film forming system

Image recording method and a printer using the same

Programmable optical multiplexer/demultiplexer

Semiconductor device and fabrication technique using a high-K liner for spacer etch stop

4-anilinofuro [3,2-c] quinoline derivatives, and preparation processes and uses of the same

Low resistance T-gate MOSFET device using a damascene gate process and an innovative oxide removal etch

Process of manufacturing a semiconductor device including a buried channel field effect transistor

Organic light emitting diode devices using thermostable hole-injection and hole-transport compounds

Sporobolus plant named 'Morning Mist'

Peach tree named 'Burpeachfourteen'

Chrysanthemum plant named 'Orinoco'

Semiconductor integrated circuit device and manufacturing method of that

Hybrid vehicle and method of controlling the same

Process for fabricating hollow electroactive devices

High-throughput low-latency next generation internet network using optical label switching and high-speed optical header generation detection and reinsertion