发明名称 Chimically sensitive, dimensionally-stable organosilicon material composition and techniques.
摘要 <p>A dimensionally-stable organosilicon material composition and method for producing the material composition including non-crosslinkable, continuous phase silicone with silica filler material dispersed therethrough, and having dissolved therein a variably-radiative material (e.g., ruthenium dye) responsive to the concentration of a selected analyte (e.g., oxygen), and the products of a reaction between water and a modifier material selected for establishing the sensitivity of said variably-radiative material to the selected analyte.</p>
申请公布号 EP0363993(A2) 申请公布日期 1990.04.18
申请号 EP19890119166 申请日期 1989.10.16
申请人 HEWLETT-PACKARD COMPANY 发明人 MAUZE, GANAPATI R.;SPIRA-SOLOMON, DARLENE J.;HOLLOWAY, ROBERT R.
分类号 G01N21/76;C08K13/02;G01N31/22 主分类号 G01N21/76
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