发明名称 Verfahren zur Herstellung einer Röntgenstrahlmasken-Struktur
摘要 A method of making an X-ray mask structure having an X-ray absorber in a desired pattern on the surface of a support film held by a frame comprises the step of patterning the X-ray absorber, including a drawing step that utlizes charged particles, and the step of thereafter providing the frame with a magnetic member. The frame and the support film are each comprised of a non-magnetic material.
申请公布号 DE68926373(T2) 申请公布日期 1996.09.26
申请号 DE1989626373T 申请日期 1989.09.29
申请人 CANON K.K., TOKIO/TOKYO, JP 发明人 MIYACHI, TAKESHI, ZAMA-SHI KANAGAWA-KEN, JP;FUKUDA, YASUAKI, HADANO-SHI KANAGAWA-KEN, JP;CHIBA, KEIKO, ISEHARA-SHI KANAGAWA-KEN, JP
分类号 G03F1/14;G03F1/22;(IPC1-7):G03F1/14 主分类号 G03F1/14
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