| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resist developable with an aq. alkali agent and having high heat resistance by using specified polyhydroxyamide as a precursor of polybenzoxazole and a specified compd. as an optical base generating agent. SOLUTION: This resist contains polyhydroxyamide having a mol.wt. of 5,000-1,000,000 represented by formula I as a precursor of polybenzoxazole and contains a compd. represented by formula II as an optical base generating agent by 0.01-0.5mol equiv. based on the amt. of the hydroxyl groups of the polyhydroxyamide. In the formula I, each of R1 and R2 is an arom. group and/or a hetero-cyclic group and (n) is an integer of 10-20,000. In the formula II, R3 is >=1C org. group, H or halogen, (p) is an integer of 0-4, each of R4 and R5 is <=12C org. group and R6 is H or <=10C org. group. |
