| 摘要 |
PROBLEM TO BE SOLVED: To provide a developing device capable of surely and uniformly removing unwanted part of photoresist over the entire surface of a base board. SOLUTION: A shower nozzle 7 sprays a developer 8 toward the base board 9 on a conveyer 16. A pump 13 supplies the developer 8 to the nozzle 7 with pressure P specified by a controller 15, and a vibrating source 11 vibrates the nozzle 7 with frequency F specified by the controller 15. Thus, the developer 8 is uniformly dispersed and collides with the entire surface of the photoresist on the base board 9, so that developing irregularity is eliminated, and developing degree can be adjusted by the change of the pressure P and the frequency F. |
