发明名称 CARRIAGE SYSTEM FOR SEMICONDUCTOR WAFER
摘要 PROBLEM TO BE SOLVED: To provide a carriage system for semiconductor wafer which can perform surface inspection of the reverse and obverse sides of a semiconductor wafer and also can automatically discriminate between them. SOLUTION: A carriage system S has two units of robots 3A and 3B juxtaposed on a frame 1, two units of cassettes 5A and 5B wherein wafers W are accommodated, testers 7 and 9 which perform the surface inspection of the reverse and obverse side of the wafer W, an orientation flatness register device 11 which registers the orientation flatness of the inspected wafer W, and vacant cassettes 13A, 13B, 13C, and 13D which accommodate the wafers W inspected by the testers 7 and 9, in accordance with the evaluation of the inspection result. Hands 33 of the robots 3A and 3B are so constituted as to hold the periphery of the wafer W, and the testers 7 and 9 perform surface inspection for flaw of reverse and obverse sides of the wafer W, or the adhesion of dust. Furthermore, the orientation flatness register device 11 is equipped with a pusher which has a small diameter pin for supporting the wafer W.
申请公布号 JPH11121579(A) 申请公布日期 1999.04.30
申请号 JP19970276022 申请日期 1997.10.08
申请人 MECS CORP 发明人 IMAI RYOICHI
分类号 B65G49/07;H01L21/027;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65G49/07
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