发明名称 Microscopic roughness structure with protective film and method thereof
摘要 In a protective film affixed to a microscopic roughness structure having a microscopically rough structure on the surface, water contact angle of the surface of the microscopic roughness structure is 40° or less, compressive stress obtainable when the adhesive layer of the protective film is compressed to a compression ratio of 20% is 0.6 MPa to 3.0 MPa; in the infrared absorption spectrum of the surface on the microscopically rough structure side of the microscopic roughness structure, ratio (A1/A2) of peak area A1 having absorption maximum of 3700 cm−1 to 3100 cm−1, and peak area A2 having absorption maximum of 1730±10 cm−1, is 0.1 to 0.8; in the surface of adhesive layer of the protective film, ratio (B1/B2) of peak area B1 having absorption maximum of 3700 cm−1 to 3100 cm−1, and peak area B2 having absorption maximum of 1730±10 cm−1, is 0.6 to 1.3.
申请公布号 US9519082(B2) 申请公布日期 2016.12.13
申请号 US201214238053 申请日期 2012.08.16
申请人 Mitsubishi Rayon Co., Ltd. 发明人 Takihara Tsuyoshi;Mori Seiichiro;Okamoto Eiko
分类号 G02B1/10;C09J5/06;G02B1/118 主分类号 G02B1/10
代理机构 Morgan, Lewis & Bockius LLP 代理人 Morgan, Lewis & Bockius LLP
主权项 1. A protective film-attached microscopic roughness structure comprising: a microscopic roughness structure on the surface having a microscopically rough structure having a period less than or equal to the wavelength of visible light, and a protective film for protecting the surface of the microscopic roughness structure affixed thereto, wherein the water contact angle of the surface of the microscopic roughness structure is 40° or less, the protective film comprises an adhesive layer that is in contact with the surface on the microscopically rough structure side, and the compressive stress obtainable when the adhesive layer is compressed in the thickness direction to a compression ratio of 20% is 0.6 MPa to 3.0 MPa, wherein the adhesive layer of the protective film is affixed to the entire surface of the microscopic roughness structure without extending beyond the surface of the microscopic roughness structure.
地址 Tokyo JP
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