发明名称 Process for metallization of a substrate by irradiative curing of a catalyst applied thereto
摘要 An improved additive process for metallization of substrates is described whereby a catalyst solution is applied to a surface of a substrate. Metallic catalytic clusters can be formed in the catalyst solution on the substrate surface by irradiating the substrate. Electroless plating can then deposit metal onto the portion of the substrate surface having metallic clusters. Additional metallization thickness can be obtained by electrolytically plating the substrate surface after the electroless plating step.
申请公布号 US5989653(A) 申请公布日期 1999.11.23
申请号 US19970986379 申请日期 1997.12.08
申请人 SANDIA CORPORATION 发明人 CHEN, KEN S.;MORGAN, WILLIAM P.;ZICH, JOHN L.
分类号 C23C18/16;H05K3/18;(IPC1-7):B05D3/00 主分类号 C23C18/16
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