| 摘要 |
PROBLEM TO BE SOLVED: To provide a method capable of the reliable continuously feed of vaporizing materials into a vapor depositing chamber in an inline type vapor depositing device and the recovery thereof without causing the changes of the film quality and film forming distribution in the case, while the vacuum of the vapor depositing chamber is held, film forming is continuously executed on many substrates (the materials to be vapor-deposited). SOLUTION: In a method for feeding a heat resistance type vaporizing source to a vapor depositing chamber 1 in an inline type vapor depositing device, plural load lock chambers 2 and 6 with cassette-shaped vaporizing sources 3 and 7 stored respectively on the inside are arranged connectedly to the vapor depositing chamber respectively via load lock valves 4 and 8, and the feed of the vaporizing source from the load lock chambers in a vacuum state into the vapor depositing chamber in a vacuum state and the recovery thereof are executed between each lock load chamber and the vapor depositing chamber in succession.
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