发明名称 Edging for MOSFETs, high blocking diodes, high voltage transistors, and IGBTs has a sieve-like field plate provided over the surface on or in an insulating layer
摘要 Edging for a semiconductor device has a sieve-like field plate (5) provided over the surface on or in an insulating layer. Edging for a semiconductor device consists of a semiconductor body of a first conducting type, a zone provided in a surface of the body of second conducting type, and a sieve-like field plate provided over the surface on or in an insulating layer.
申请公布号 DE19843956(C1) 申请公布日期 2000.03.16
申请号 DE1998143956 申请日期 1998.09.24
申请人 SIEMENS AG 发明人 TIHANYI, JENOE;MILLER, GERHARD;SCHAEFER, HORST;AUERBACH, FRANZ
分类号 H01L23/532;H01L29/06;H01L29/40;H01L29/51;(IPC1-7):H01L29/06;H01L29/861;H01L29/739;H01L29/78 主分类号 H01L23/532
代理机构 代理人
主权项
地址