发明名称 |
Edging for MOSFETs, high blocking diodes, high voltage transistors, and IGBTs has a sieve-like field plate provided over the surface on or in an insulating layer |
摘要 |
Edging for a semiconductor device has a sieve-like field plate (5) provided over the surface on or in an insulating layer. Edging for a semiconductor device consists of a semiconductor body of a first conducting type, a zone provided in a surface of the body of second conducting type, and a sieve-like field plate provided over the surface on or in an insulating layer.
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申请公布号 |
DE19843956(C1) |
申请公布日期 |
2000.03.16 |
申请号 |
DE1998143956 |
申请日期 |
1998.09.24 |
申请人 |
SIEMENS AG |
发明人 |
TIHANYI, JENOE;MILLER, GERHARD;SCHAEFER, HORST;AUERBACH, FRANZ |
分类号 |
H01L23/532;H01L29/06;H01L29/40;H01L29/51;(IPC1-7):H01L29/06;H01L29/861;H01L29/739;H01L29/78 |
主分类号 |
H01L23/532 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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