发明名称 |
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group |
摘要 |
A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C-O-C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group =C-COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.
|
申请公布号 |
US6312869(B1) |
申请公布日期 |
2001.11.06 |
申请号 |
US20000592419 |
申请日期 |
2000.06.12 |
申请人 |
SHIN-ETSU CHEMICAL, CO., LTD. |
发明人 |
WATANABE SATOSHI;WATANABE OSAMU;FURIHATA TOMOYOSHI;TAKEDA YOSHIHUMI;NAGURA SHIGEHIRO;ISHIHARA TOSHINOBU;YAMAOKA TSUGUO |
分类号 |
C08F8/00;G03F7/004;G03F7/039;(IPC1-7):G03F7/039;G03F7/30 |
主分类号 |
C08F8/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|