| 发明名称 |
Low dielectric constant materials and their production and use |
| 摘要 |
Silica-based low dielectric constant materials having three-dimensional network structures containing siloxane backbones which comprise Si04 tetrahedron structural units, as well as their production and use. The materials can be applied as interlayer dielectrics for semiconductor elements and the like.
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| 申请公布号 |
US2002156180(A1) |
申请公布日期 |
2002.10.24 |
| 申请号 |
US20020121381 |
申请日期 |
2002.04.12 |
| 申请人 |
YAMADA NORIKO;TAKAHASHI TORU;SAKON TADASHI;MATSUZAKI YOICHI;NOGAMI ATSUSHI;KATAYAMA SHINGO;SHIINA IKUKO |
发明人 |
YAMADA NORIKO;TAKAHASHI TORU;SAKON TADASHI;MATSUZAKI YOICHI;NOGAMI ATSUSHI;KATAYAMA SHINGO;SHIINA IKUKO |
| 分类号 |
C09D183/04;C09D183/14;H01L21/312;(IPC1-7):C08J3/00 |
主分类号 |
C09D183/04 |
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